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Propylene Glycol Monomethyl Ether (PGME)
Propylene Glycol Monomethyl Ether (PGME): Colorless liquid organic solvent, mainly used in the lithography process of semiconductor manufacturing. In semiconductor and circuit board manufacturing processes, PGME can be used as a solvent and cleaning agent to remove surface contaminants and clean electronic components.
Propylene Glycol Monomethyl Ether Acetate (PGMEA)
Propylene Glycol Monomethyl Ether Acetate (PGMEA): Colorless, transparent, volatile liquid organic solvent, mainly used in semiconductor manufacturing process lithography process. In the photolithography process, PGMEA is used as a thinner for a developer and a cleaning agent for cleaning residues and dirt on the surface of a semiconductor device.
p-Tert-butoxystyrene (pTBS): one of the derivatives of hydroxyl styrene, is one of the most widely used monomers for KrF lithography resin, which can meet the needs of resin customization.
p-ethoxyethoxystyrene (pEES): can be applied to special specifications of the photoresist resin.
p-Acetoxystyrene (pACS):pACS is the first p-hydroxystyrene derivative produced by the company as a raw material for KrF lithography resin. After years of technology development, the production cost has been greatly reduced and the production process is environmentally friendly.