Home
Products
Monomers
Solvent
Customization
R & D and production
Production base
R & D Center
Press announcement
Notification announcement
Company News
Industry News
Exhibition Information
Social responsibility
About Us
Company Profile
Development process
Company culture
Honor qualification
Contact Us
中文版
日语版
English
日本語
Advantages and Disadvantages of Photoresist Harm and Protection of Photoresist
1. High precision. Photoresist can form micron-level patterns on the surface of the chip with very high accuracy and stability. 2, the scope of application is wide. Photoresists can be applied to different types of chip materials, including silicon, glass, ceramics, etc. 3. Fast processing speed. The photoresist can finish the processing and treatment of the chip surface in a short time, which improves the production efficiency. However, photoresist also has some shortcomings, including the following:
29
2023
/
11
The relationship between photoresist and chip The role of photoresist in chip manufacturing
The Group believes that in the information age of economic globalization, informatization will become the only way for SMEs to enhance their competitiveness, and e-commerce will become the key path for enterprises to achieve informatization. Therefore, the Group will continue to focus on promoting the e-commerce and informatization process of Chinese SMEs, continue to innovate, continue to introduce more and better services, build intelligent Chinese enterprises, and achieve smart entrepreneurs!
28
2022
07
Raw materials domestic independent supply: photoresist local replacement of key links.
Lithography technology refers to the use of optical-chemical reaction principle and chemical and physical etching methods, the graphics transferred to the medium layer, the formation of effective graphics window or functional graphics process technology, is one of the core links in the optoelectronic information industry chain. In the manufacturing process of large-scale integrated circuits, lithography and etching technology is the most important process of fine circuit graphics processing, which determines the minimum feature size of the chip. Photoresist is the most important consumable in the lithography process, and its performance determines the quality of lithography. Photoresist is the core upstream material for micrographics processing in the field of microelectronics, and it is also the material with the highest technical barriers to fine chemicals. The industrial chain in which photoresist is located covers a wide range, from upstream basic chemical materials industry, fine chemicals industry to midstream photoresist preparation, to downstream PCB, panel, semiconductor industry, to electronics and other application terminals. At present, the global photoresist supply is highly concentrated, overseas leaders have achieved high-end process mass production, while China's photoresist started late, mainly in the low-end products, high-end areas are gradually breaking through the process, domestic substitution is continuing. The upstream core raw materials of semiconductor photoresist in China are still monopolized by foreign manufacturers, and the localization rate is very low, which increases the domestic photoresist production cost and supply chain risk, so the domestic independent supply of raw materials is the key link of photoresist local substitution.
10
01
