The role of photoresist
Release time:
2021-11-09
Photoresist is a kind of high molecular polymer material with photosensitive chemical effect (or sensitive to electron energy), which is the medium for transferring ultraviolet exposure or electron beam exposure pattern. The English name of photoresist is resist, which is also translated as resist, photoresist, etc. The function of the photoresist is to protect the surface of the substrate as an etching resist. Photoresist is only an image of the argument, because the photoresist from the appearance of a colloidal liquid.
Photoresist is a kind of high molecular polymer material with photosensitive chemical effect (or sensitive to electron energy), which is the medium for transferring ultraviolet exposure or electron beam exposure pattern. The English name of photoresist is resist, which is also translated as resist, photoresist, etc. The function of the photoresist is to protect the surface of the substrate as an etching resist. Photoresist is only an image of the argument, because the photoresist from the appearance of a colloidal liquid.
Photoresist is usually in the form of a thin film uniformly covering the surface of the substrate. When ultraviolet light or electron beam is irradiated, the characteristics of the photoresist material itself will change. After developing with developer, the exposed negative photoresist or unexposed positive photoresist will remain on the surface of the substrate, thus transferring the designed micro-nano structure to the photoresist. Subsequent etching, deposition and other processes can further transfer the pattern to the substrate under the photoresist, and finally use a glue remover to transfer the pattern to the substrate under the photoresist.
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