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Products
Dimethylbenzene Xylene(DMB): Colorless transparent liquid, xylene or xylene aromatic hydrocarbon mixture. In the semiconductor field, it is often used as cleaning degreases and certain photoresist solvents.
Glycerol Triacetate(GTA): Colorless oily liquid. Triacetin is one of the widely used solvents and is used as an additive for resist materials in the semiconductor industry.
Chlorostyrene (PCST):PCST is used as one of the raw materials of KrF lithography resin, it can be used to polymerize into polymers, such as polystyrene, these polymers are widely used in lithography resin, etc.
P-hydroxystyrene (pHS):pHS is used as one of the raw materials of KrF lithography resin, and can be copolymerized with other monomers through polymerization reaction to produce excellent polymers. Commonly used in semiconductor and other fields.
Isopropyl alcohol (IPA):Colorless transparent liquid, isopropyl alcohol is one of the widely used solvents, used in the semiconductor industry for cleaning pipelines.
Cyclohexanone (CYC): Colorless transparent liquid, cyclohexanone is an important chemical raw material, used in the semiconductor industry cleaning agent and cleaning pipeline.
Butyl acetate (nBA): colorless transparent liquid, butyl acetate is an excellent organic solvent, commonly used as a cleaning agent after the development of negative photoresist.
Ethyl Acetate (EtAc): Colorless transparent liquid, ethyl acetate as an organic solvent, can be used to clean and remove contaminants on the surface of semiconductors, and can also be used for degreasing and degluing of semiconductors.
Cyclohexane (CYH): colorless transparent liquid, cyclohexane is used as photoresist solvent and cleaning degreasy agent, MOS grade is mainly used for discrete devices, medium and large-scale integrated circuits, BV-III grade is mainly used for ultra-large-scale integrated circuits, plays an important role in the electronics industry.
Methyl methacrylate (MMA): Colorless transparent liquid, mainly used for the manufacture of photoresist, in order to make the photoresist material has a higher molecular density to achieve good exposure results.
Methanol (MeOH): Colorless transparent liquid, widely used in semiconductor cleaning, lead protective film removal, precision printing and other fields, with excellent decontamination performance and cleanliness, can greatly improve the manufacturing accuracy and quality of semiconductor products.
Colorless and transparent oily liquid, NMP is one of the important solvents for electronic devices such as semiconductors, integrated circuits, and liquid crystal displays. It can dissolve electronically active materials such as metals, oxides, and polymers for processes such as plating, etching, and cleaning.
Propylene Glycol Monomethyl Ether (PGME)
Propylene Glycol Monomethyl Ether (PGME): Colorless liquid organic solvent, mainly used in the lithography process of semiconductor manufacturing. In semiconductor and circuit board manufacturing processes, PGME can be used as a solvent and cleaning agent to remove surface contaminants and clean electronic components.
Propylene Glycol Monomethyl Ether Acetate (PGMEA)
Propylene Glycol Monomethyl Ether Acetate (PGMEA): Colorless, transparent, volatile liquid organic solvent, mainly used in semiconductor manufacturing process lithography process. In the photolithography process, PGMEA is used as a thinner for a developer and a cleaning agent for cleaning residues and dirt on the surface of a semiconductor device.
p-Tert-butoxystyrene (pTBS): one of the derivatives of hydroxyl styrene, is one of the most widely used monomers for KrF lithography resin, which can meet the needs of resin customization.
p-ethoxyethoxystyrene (pEES): can be applied to special specifications of the photoresist resin.
p-Acetoxystyrene (pACS):pACS is the first p-hydroxystyrene derivative produced by the company as a raw material for KrF lithography resin. After years of technology development, the production cost has been greatly reduced and the production process is environmentally friendly.